The T-Series Desktop Coaters are high productivity tools that deliver consistent and repeatable results in the fully automated system that has an ergonomic design and compact footprint. The T-series Desktop Coaters expand the R-Series with an added Turbo Molecular Pump (TMP) to achieve higher vacuum levels and are available in 4 models to chose from:
- DST – dedicated Sputter Coater
- DST1-L – large chamber, dedicated Sputter Coater
- DCT – dedicated Carbon Coater (fiber or rod)
- DCT-L – large chamber, dedicated Carbon Coater (fiber or rod)
- DSCT – dual purpose Sputter and Carbon Coater
The DST Sputter Coater model is a dedicated coating system which is able to coat noble metals such as gold (Au), palladium (Pd), platinum (Pt), gold/palladium (Au/Pd), and Iridium (Ir) thin films as well as oxidizing coatings such as Chrome (Cr), Tungsten (W) and others on non-conductive or poorly conductive specimens, typically for higher resolution Field Emission FE-SEM imaging and analysis. Uniform thin films with superior fine-grain sizes are formed in a fast cycle time suitable for advanced high magnification scanning electron microscopy. The DST1-L is a special model with a larger 300mm chamber and 4″ (100mm) target for coating of larger samples like wafers. We also offer the DST3 which is a multi-source sputter system for more complex coating operations and alloying
The DCT Carbon Coater model is a dedicated carbon coating system and can be configured with either a Thread or Rod carbon source. Carbon thin films are essentially X-Ray transparent for EDS analysis and are applied to non-conductive or poorly conductive specimens, typically for advanced SEM/EDS analysis. The DCT-L is a special model with a larger 300mm chamber for high throughput coating of multiple metallurgical mounts and thin section slides.
The DSCT combines both Sputter and Carbon coating into a modular unit for SEM sample preparation and can be configured as a sputter coater OR carbon coater (thread) with interchangeable heads in one instrument.
With a dual pumping system consisting of an external vacuum pump (included) and a directly attached TMP (turbo molecular pump), the T-Series achieves vacuum in the micro-Torr range which is a suitable vacuum range for noble metal sputter coating and advanced evaporative coating and allows fast vacuum to be achieved resulting in an adequate coating grain size for high magnification SEM analysis. If samples will be examined using lower resolution standard SEM (tungsten source) then we recommend our R-Series Coaters which are more economical and adequate for this level of microscopy.